000 | 01583nam a22002417a 4500 | ||
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003 | CUTN | ||
005 | 20190218141717.0 | ||
008 | 190218b xxu||||| |||| 00| 0 eng d | ||
020 | _a9056997149 | ||
020 | _a9789056997144 | ||
041 | _aEnglish | ||
082 |
_a621.381 _bWAD |
||
100 | _aWada, K . [Ed.] | ||
245 |
_aDefects in optoelectronic materials _cK Wada; Stella W Pang |
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260 |
_aAmsterdam : _bGordon and Breach Science Pub., _c©2001. |
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300 |
_a412 pages : _billustrations ; _c23 cm. |
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440 |
_aOptoelectronic properties of semiconductors and superlattices, _vv. 11. |
||
505 |
_t1. Saturation of Free Carrier Concentration in Semiconductors / W. Walukiewicz --
_t2. Point of Defect Formation Near Surfaces / K. Wada -- _t3. Optical Characterization of Plasma Etching Induced Damage / E.L. Hu and C.-H. Chen -- _t4. Dry Etch Damage in Widegap Semiconductor Materials / S.J. Pearton and R.J. Shul -- _t5. Generation, Removal, and Passivation of Plasma Process Induced Defects / S.W. Pang -- _t6. Defects Induced by Metal Semiconductor Contacts Formation / T. Okumura -- _t7. Electrical Characterization of Defects Introduced in Epitaxially Grown GaAs by Electron-, Proton- and He-Ion Irradiation / F.D. Auret -- _t8. Instability and Defect Reaction / Y. Shinozuka -- _t9. Defects and Device Degradation / K. Wada and H. Fushimi. |
||
650 | _aOptoelectronic devices -- Defects. | ||
650 | _aOptoelectronic devices. | ||
650 | _aOptoelectronics -- Materials. | ||
942 |
_2ddc _cBOOKS |
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999 |
_c27016 _d27016 |