Handbook of cleaning for semiconductor manufacturing [electronic resource] : fundamentals and applications / [edited by] Karen A. Reinhardt, Richard F. Reidy.

Includes bibliographical references and index.

Fundamentals. Surface and Colloidal Chemical Aspects of Wet Cleaning / Srini Raghavan, Manish Keswani, Nandini Venkataraman -- The Chemistry of Wet Cleaning / D. Martin Knotter -- The Chemistry of Wet Etching / D. Martin Knotter -- Surface Phenomena: Rinsing and Drying / Karen A. Reinhardt, Richard F. Reidy, John A. Marsella -- Fundamental Design of Chemical Formulations / Robert J. Rovito, Michael B. Korzenski, Ping Jiang, Karen A. Reinhardt -- Filtering, Recirculating, Reuse, and Recycling of Chemicals / Barry Gotlinsky, Kevin T. Pate, Donald C. Grant -- Applications. Cleaning Challenges of High-k/Metal Gate Structures / Muhammad M. Hussain, Denis Shamiryan, Vasile Paraschiv, Kenichi Sano, Karen A. Reinhardt -- High Dose Implant Stripping / Karen A. Reinhardt, Michael B. Korzenski -- Aluminum Interconnect Cleaning and Drying / David J. Maloney -- Low-k/Cu Cleaning and Drying / Karen A. Reinhardt, Richard F. Reidy, Jerome Daviot -- Corrosion and Passivation of Copper / Darryl W. Peters -- Germanium Surface Conditioning and Passivation / Sonja Sioncke, Yves J. Chabal, Martin M. Frank -- Wafer Reclaim / Michael B. Korzenski, Ping Jiang -- Direct Wafer Bonding Surface Conditioning / Hubert Moriceau, Yannick C. Le Tiec, Frank Fournel, Ludovic F. L. Ecarnot, Sebastien L. E. Kerdil̈s, Daniel Delprat, Christophe Maleville -- New Directions. Novel Analytical Methods for Cleaning Evaluation / Chris M. Sparks, Alain C. Diebold -- Stripping and Cleaning for Advanced Photolithography Applications / John A. Marsella, Dana L. Durham, Leslie D. Molnar.

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