Handbook of cleaning for semiconductor manufacturing [electronic resource] : fundamentals and applications / [edited by] Karen A. Reinhardt, Richard F. Reidy.
Material type: TextPublication details: Salem, Mass. : Scrivener ; Hoboken, N.J. : John Wiley & Sons, Inc., c2011.ISBN:- 9780470625958
- 0470625953
- 9781118071748 (electronic bk.)
- 1118071743 (electronic bk.)
- 621.3815/2 23
- QC611.6.S9 H36 2011
- TK7871.85
Item type | Current library | Call number | Copy number | Status | Date due | Barcode |
---|---|---|---|---|---|---|
General Books | CUTN Central Library Medicine, Technology & Management | 621.3815/2 (Browse shelf(Opens below)) | 1 | Available | 10609 |
Includes bibliographical references and index.
Fundamentals. Surface and Colloidal Chemical Aspects of Wet Cleaning / Srini Raghavan, Manish Keswani, Nandini Venkataraman -- The Chemistry of Wet Cleaning / D. Martin Knotter -- The Chemistry of Wet Etching / D. Martin Knotter -- Surface Phenomena: Rinsing and Drying / Karen A. Reinhardt, Richard F. Reidy, John A. Marsella -- Fundamental Design of Chemical Formulations / Robert J. Rovito, Michael B. Korzenski, Ping Jiang, Karen A. Reinhardt -- Filtering, Recirculating, Reuse, and Recycling of Chemicals / Barry Gotlinsky, Kevin T. Pate, Donald C. Grant -- Applications. Cleaning Challenges of High-k/Metal Gate Structures / Muhammad M. Hussain, Denis Shamiryan, Vasile Paraschiv, Kenichi Sano, Karen A. Reinhardt -- High Dose Implant Stripping / Karen A. Reinhardt, Michael B. Korzenski -- Aluminum Interconnect Cleaning and Drying / David J. Maloney -- Low-k/Cu Cleaning and Drying / Karen A. Reinhardt, Richard F. Reidy, Jerome Daviot -- Corrosion and Passivation of Copper / Darryl W. Peters -- Germanium Surface Conditioning and Passivation / Sonja Sioncke, Yves J. Chabal, Martin M. Frank -- Wafer Reclaim / Michael B. Korzenski, Ping Jiang -- Direct Wafer Bonding Surface Conditioning / Hubert Moriceau, Yannick C. Le Tiec, Frank Fournel, Ludovic F. L. Ecarnot, Sebastien L. E. Kerdil̈s, Daniel Delprat, Christophe Maleville -- New Directions. Novel Analytical Methods for Cleaning Evaluation / Chris M. Sparks, Alain C. Diebold -- Stripping and Cleaning for Advanced Photolithography Applications / John A. Marsella, Dana L. Durham, Leslie D. Molnar.
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